Properties of SixNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using SiH4/NH3/Ar as diffusion barrier film

✍ Scribed by Thuy T.T. Pham; J.H. Lee; Y.S. Kim; G.Y. Yeom

• Book ID: 108278446
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 533 KB
• Volume: 202
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2008.06.034