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Low temperature growth of highly crystallized silicon thin films using hydrogen and argon dilution

✍ Scribed by S Hamma; P Roca i Cabarrocas

Book ID
117149050
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
142 KB
Volume
227-230
Category
Article
ISSN
0022-3093

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## Abstract Columnar growth was observed in the amorphous part of mixed phase layers deposited at very low substrate temperatures. The width of the columns and the layer thickness at which they are first distinguishable in a cross‐sectional transmission electron microscope (X‐TEM) image, about 120