Low temperature–low hydrogen content silicon nitrides thin films deposited by PECVD using dichlorosilane and ammonia mixtures

✍ Scribed by G. Santana; J. Fandiño; A. Ortiz; J.C. Alonso

• Book ID: 116668477
• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 201 KB
• Volume: 351
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/j.jnoncrysol.2005.02.007