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Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring

✍ Scribed by E.V. Johnson; S. Pouliquen; P.A. Delattre; J.P. Booth


Book ID
119301118
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
468 KB
Volume
358
Category
Article
ISSN
0022-3093

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