Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition

✍ Scribed by Knisley, Thomas J.; Ariyasena, Thiloka C.; Sajavaara, Timo; Saly, Mark J.; Winter, Charles H.

• Book ID: 127153721
• Publisher: American Chemical Society
• Year: 2011
• Tongue: English
• Weight: 785 KB
• Volume: 23
• Category: Article
• ISSN: 0897-4756
• DOI: 10.1021/cm202475e