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Low-temperature deposition of highly crystallized silicon films on Al-coated polyethylene napthalate by inductively coupled plasma CVD

โœ Scribed by Jinxiao Wang; Pingqi Gao; Min Yin; Yanli Qin; Hengqing Yan; Junshuai Li; Shanglong Peng; Deyan He


Book ID
116604960
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
768 KB
Volume
481
Category
Article
ISSN
0925-8388

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## Abstract We report on the fabrication of germanium quantum dots on silicon oxide and their growth mechanism. Germanium quantum dots were deposited by inductivelyโ€coupled plasma CVD at 400โ€‰ยฐC. Gold nanoparticles, attached to silicon oxide through a selfโ€assembled monolayer, were adopted as cataly