Highly doped p-type microcrystalline silicon thin films fabricated by a low-frequency inductively coupled plasma at a low temperature

✍ Scribed by Yan, W S; Wei, D Y; Xu, S; Sern, C C; Zhou, H P

• Book ID: 121437737
• Publisher: Institute of Physics
• Year: 2011
• Tongue: English
• Weight: 901 KB
• Volume: 44
• Category: Article
• ISSN: 0022-3727
• DOI: 10.1088/0022-3727/44/34/345401