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Low-Temperature Al 2 O 3 Atomic Layer Deposition

✍ Scribed by Groner, M. D.; Fabreguette, F. H.; Elam, J. W.; George, S. M.

Book ID
120515860
Publisher
American Chemical Society
Year
2004
Tongue
English
Weight
267 KB
Volume
16
Category
Article
ISSN
0897-4756

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Mass Analysis of Growth of Al2O3 Thin Fi
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## Abstract Atomic layer deposition (ALD) at 100 °C provides a conformal coating on woven cotton with a tortuous and complex surfaces. The woven structures are completely preserved and replicated with thin coating of Al~2~O~3~, even after removing the cotton templates. The replicated woven structur