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Low pressure MOCVD of TiN thin films

✍ Scribed by So Won Kim; Hitoshi Jimba; Atsushi Sekiguchi; Osamu Okada; Naokichi Hosokawa

Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 442 KB
Volume: 100-101
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(96)00456-4

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