๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Photo-MOCVD of PbTiO3 thin films

โœ Scribed by Takuma Katayama; Masashi Fujimoto; Masaru Shimizu; Tadashi Shiosaki


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
410 KB
Volume
115
Category
Article
ISSN
0022-0248

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Growth of PbTiO3 films by photo-MOCVD
โœ Masaru Shimizu; Takuma Katayama; Tadashi Shiosaki ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 124 KB
MOCVD of BiFeO3 Thin Films on SrTiO3
โœ J. Thery; C. Dubourdieu; T. Baron; C. Ternon; H. Roussel; F. Pierre ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 356 KB ๐Ÿ‘ 1 views
Growth of SrTiO3 thin epitaxial films by
โœ K. Frรถhlich; D. Machajdรญk; A. Rosovรก; I. Vรกvra; F. Weiss; B. Bochu; J.P. Senateu ๐Ÿ“‚ Article ๐Ÿ“… 1995 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 557 KB
Deposition of electroceramic thin films
โœ J. Lindner; M. Schumacher; M. Dauelsberg; F. Schienle; S. Miedl; D. Burgess; E. ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 282 KB ๐Ÿ‘ 2 views

MOCVD (metalยฑorganic chemical vapor deposition) of new materials, such as perovskite-type ceramic thin ยฎlms, will be a major key technology in the ยฎeld of ULSI non-volatile and volatile memory applications. This article outlines the latest trends in the ยฎeld of MOCVD equipment and process developmen