✦ LIBER ✦

Low pressure magnetron sputtering using ionized, sputtered species

✍ Scribed by Witold Posadowski

Book ID: 107930128
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 323 KB
Volume: 49
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(91)90071-4

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Low-pressure magnetron sputtering

✍ J Musil 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 471 KB

The paper gives a short survey of the present state of art in low-pressure sputtering and self-sputtering. It shows main advantages of low pressure sputtering, particularly new physical conditions, i.e. (i) collisionless sight-of-line deposition process ; (ii) assistance of fast neutrals in the film

A low working pressure magnetron sputter

A low working pressure magnetron sputtering source

✍ L Kostadinov; D Dobrev 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 284 KB

Low pressure magnetron sputtering and se

Low pressure magnetron sputtering and selfsputtering discharges

✍ S Kadlec; J Musil 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 557 KB

Optimized magnetic field shape for low p

Optimized magnetic field shape for low pressure magnetron sputtering

✍ Kadlec, S.; Musil, J. 📂 Article 📅 1995 🏛 AVS (American Vacuum Society) 🌐 English ⚖ 488 KB

TiN films grown by reactive magnetron sp

TiN films grown by reactive magnetron sputtering with enhanced ionization at low discharge pressures

✍ S. Kadlec; J. Musil; V. Valvoda; W.-D. Münz; H. Petersein; J. Schroeder 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 570 KB

Pressure stability in reactive magnetron

Pressure stability in reactive magnetron sputtering

✍ A.G. Spencer; R.P. Howson; R.W. Lewin 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 456 KB