The paper gives a short survey of the present state of art in low-pressure sputtering and self-sputtering. It shows main advantages of low pressure sputtering, particularly new physical conditions, i.e. (i) collisionless sight-of-line deposition process ; (ii) assistance of fast neutrals in the film
โฆ LIBER โฆ
A low working pressure magnetron sputtering source
โ Scribed by L Kostadinov; D Dobrev
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 284 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
No coin nor oath required. For personal study only.
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