๐”– Bobbio Scriptorium
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A low working pressure magnetron sputtering source

โœ Scribed by L Kostadinov; D Dobrev


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
284 KB
Volume
42
Category
Article
ISSN
0042-207X

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The paper gives a short survey of the present state of art in low-pressure sputtering and self-sputtering. It shows main advantages of low pressure sputtering, particularly new physical conditions, i.e. (i) collisionless sight-of-line deposition process ; (ii) assistance of fast neutrals in the film

Bioactive glass thin films deposited by
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