TiN films grown by reactive magnetron sputtering with enhanced ionization at low discharge pressures

✍ Scribed by S. Kadlec; J. Musil; V. Valvoda; W.-D. Münz; H. Petersein; J. Schroeder

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 570 KB
• Volume: 41
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(90)94233-g