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Lithography-free fabrication of silicon nanowire and nanohole arrays by metal-assisted chemical etching

โœ Scribed by Ruiyuan Liu, Fute Zhang, Celal Con, Bo Cui, Baoquan Sun


Book ID
120947642
Publisher
Springer-Verlag
Year
2013
Tongue
English
Weight
605 KB
Volume
8
Category
Article
ISSN
1931-7573

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## Abstract Metalโ€assisted etching is used in conjunction with blockโ€copolymer lithography to create ordered and denselyโ€packed arrays of highโ€aspectโ€ratio singleโ€crystal silicon nanowires with uniform crystallographic orientations. Nanowires with diameters and spacings down to 19โ€‰nm and 10โ€‰nm, res