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Metal-Assisted Chemical Etching Using Silica Nanoparticle for the Fabrication of a Silicon Nanowire Array

✍ Scribed by Kato, Shinya; Watanabe, Yuya; Kurokawa, Yasuyoshi; Yamada, Akira; Ohta, Yoshimi; Niwa, Yusuke; Hirota, Masaki

Book ID: 125522205
Publisher: Institute of Pure and Applied Physics
Year: 2012
Tongue: English
Weight: 811 KB
Volume: 51
Category: Article
ISSN: 0021-4922
DOI: 10.1143/JJAP.51.02BP09

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## Abstract Metal‐assisted etching is used in conjunction with block‐copolymer lithography to create ordered and densely‐packed arrays of high‐aspect‐ratio single‐crystal silicon nanowires with uniform crystallographic orientations. Nanowires with diameters and spacings down to 19 nm and 10 nm, res