𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Liquid Injection MOCVD of Zirconium Dioxide Using a Novel Mixed Ligand Zirconium Precursor

✍ Scribed by Anthony C. Jones; Timothy J. Leedham; Peter J. Wright; Michael J. Crosbie; Dennis J. Williams; Kirsty A. Fleeting; Hywel O. Davies; David J. Otway; Paul O′Brien


Publisher
John Wiley and Sons
Year
1998
Tongue
English
Weight
240 KB
Volume
4
Category
Article
ISSN
0948-1907

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


MOCVD of Zirconia Thin Films by Direct L
✍ Anthony C. Jones; Timothy J. Leedham; Peter J. Wright; Michael J. Crosbie; Penel 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 348 KB 👁 2 views

Turning to Pb(pta) 2 , it is assumed that the first stage of the complex molecule decomposition involves the elimination of the Hpta molecule, then a consequent removal of the fragments from the residue occurs with the release of lead and carbon in the solid state (Eq. 4). Pb(pta) 2 ! {Pb,C} (s) + H

An investigation into the growth of magn
✍ Hywell O Davies; Anthony C Jones; Timothy J Leedham; Peter J Wright; Michael J C 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 77 KB 👁 2 views

The double metal alkoxide Mg[Nb(OEt) 6 ] 2 (2EtOH) has been in investigated as a single-source precursor for the deposition of magnesium niobium oxide and lead magnesium niobate by liquid-injection MOCVD. The presence of Pb(thd) 2 (thd = 2,2,6,6-tetramethylheptane-3,5-dionate) has been shown to sign

Chemical vapour deposition of the oxides
✍ Ryan C. Smith; Tiezhong Ma; Noel Hoilien; Lancy Y. Tsung; Malcolm J. Bevan; Luig 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 340 KB 👁 2 views

A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar