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Laser reactive ablation deposition of titanium carbide films

✍ Scribed by G. Leggieri; A. Luches; M. Martino; A. Perrone; G. Majni; P. Mengucci; I.N. Mihailescu


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
516 KB
Volume
258
Category
Article
ISSN
0040-6090

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In this work a frequency-doubled Nd:glass laser with a pulse duration of 250 fs has been used to ablate a TaC target and to deposit thin films on silicon. The results have been compared with those previously obtained by nanosecond pulsed laser deposition and evidence of large differences in the plas