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Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna

✍ Scribed by Takahashi, Eiji; Nishigami, Yasuaki; Tomyo, Atsushi; Fujiwara, Masaki; Kaki, Hirokazu; Kubota, Kiyoshi; Hayashi, Tsukasa; Ogata, Kiyoshi; Ebe, Akinori; Setsuhara, Yuichi

Book ID: 127216966
Publisher: Institute of Pure and Applied Physics
Year: 2007
Tongue: English
Weight: 266 KB
Volume: 46
Category: Article
ISSN: 0021-4922
DOI: 10.1143/jjap.46.1280

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