Kinetics of the reactions of SiH3 with O2 and N2O
โ Scribed by Irene R. Slagle; James R. Bernhardt; David Gutman
- Book ID
- 107733266
- Publisher
- Elsevier Science
- Year
- 1988
- Tongue
- English
- Weight
- 421 KB
- Volume
- 149
- Category
- Article
- ISSN
- 0009-2614
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
The rate constants for the reaction of CN with NzO and COz have been measured by the laser dissociation/laser-induced fluorescence (two-laser pump-probe) technique at temperatures between 300 and 740 K. The rate of CN + NzO was measurable above 500 K, with a least-squares averaged rate constant, k =
A relative rate approach has , been used to measure the reactivity of CF,O radicals towards ozone. Using k(CFaO+NOa)=2,7x IO-" cm' molecule-' s-' as the referencereactioqanupperlimit ofk(CF,O+Os) 63~ 10-'4cmSmolecule-' was determined at 295 K and 700 Torr of O2 diluent. The implications for the atmo
Laser-excited fluorescence detection of HSiCl was used to measure the room-temperature kinetics of the reactions of HSiCl with SiH, and Sic&HZ. An upper bound was also obtained for the HSiCl+Hz rate coefficient. Rate coefftcients for insertion of HSiCl into SiH., and SiC12H2 are 3-4 orders of magnit