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Kinetics of the chemical reaction between dichlorosilane and ammonia during silicon nitride film deposition

✍ Scribed by G. Peev; L. Zambov; Y. Yanakiev

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
464 KB
Volume
189
Category
Article
ISSN
0040-6090

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## Abstract The kinetics of the CVD of boron nitride from trimethoxyborane (TMOB) and ammonia (NH~3~) under atmospheric pressure was investigated by varying the following process parameters: temperature, residence time of the reactants, molar fraction of TMOB, and the NH~3~/TMOB ratio, Ξ³. A kinetic