This article discusses the influence of both technological modes and structural parameters of In 2 O 3 films deposited by spray pyrolysis from InCl 3 water solution on response to reducing gases (CO and H 2 ). Conclusions were drawn on the main factors, which influence both gas response of In 2 O 3
Kinetics of gas response to reducing gases of SnO2 films, deposited by spray pyrolysis
โ Scribed by G. Korotcenkov; V. Brinzari; V. Golovanov; Y. Blinov
- Publisher
- Elsevier Science
- Year
- 2004
- Tongue
- English
- Weight
- 132 KB
- Volume
- 98
- Category
- Article
- ISSN
- 0925-4005
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โฆ Synopsis
The present paper is devoted to systematic measurements of SnO 2 gas response to reducing gases in transient mode. SnO 2 films were deposited by spray pyrolysis from SnCl 4 -water solution. The influence of operation temperature (25-500 โข C) on gas response (S) to CO and H 2 (0.1-0.5%), response time (ฯ), shape of S(T) curves, and activation energy of ฯ(1/kT) dependencies is discussed. Three operating temperature ranges with different activation energies of 0.3-0.38, 0.6-0.7, and 1.1-1.4 eV were selected on ฯ(1/kT) dependencies. The mechanism of oxygen and water influence on gas sensing characteristics of SnO 2 films has been proposed. It was concluded that adsorption/desorption processes of molecular oxygen, hydroxyl groups, and atomic oxygen have dominant influence on electro-physical and gas sensing characteristics of SnO 2 films in the temperature ranges of 25-150; 200-400 and >450 โข C, respectively.
๐ SIMILAR VOLUMES
The possibilities of successive ionic layer deposition (SILD) technology for deposition of nano-scalled SnO 2 films are discussed in this article. SnO 2 films deposited using this technology contain porous agglomerated structures consisting of nano-size crystallites. Even after annealing at T an = 8