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In2O3 films deposited by spray pyrolysis: gas response to reducing (CO, H2) gases

✍ Scribed by G. Korotcenkov; V. Brinzari; A. Cerneavschi; M. Ivanov; A. Cornet; J. Morante; A. Cabot; J. Arbiol

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
219 KB
Volume
98
Category
Article
ISSN
0925-4005

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✦ Synopsis

This article discusses the influence of both technological modes and structural parameters of In 2 O 3 films deposited by spray pyrolysis from InCl 3 water solution on response to reducing gases (CO and H 2 ). Conclusions were drawn on the main factors, which influence both gas response of In 2 O 3 films and time constants of response and recovery processes. They are film thickness and porosity. It was established that films deposited at low pyrolysis temperatures (350-400 β€’ C) from low precursor concentration solutions (<0.2 M) had maximal gas response and minimal constant times of both response, and recovery processes.

πŸ“œ SIMILAR VOLUMES

Kinetics of gas response to reducing gas
Kinetics of gas response to reducing gases of SnO2 films, deposited by spray pyrolysis
✍ G. Korotcenkov; V. Brinzari; V. Golovanov; Y. Blinov πŸ“‚ Article πŸ“… 2004 πŸ› Elsevier Science 🌐 English βš– 132 KB

The present paper is devoted to systematic measurements of SnO 2 gas response to reducing gases in transient mode. SnO 2 films were deposited by spray pyrolysis from SnCl 4 -water solution. The influence of operation temperature (25-500 β€’ C) on gas response (S) to CO and H 2 (0.1-0.5%), response tim