Preparation and characterization of SnO2 thin films deposited by spray pyrolysis from SnCl2 and SnCl4 precursors
β Scribed by G. Gordillo; L.C. Moreno; W. de la Cruz; P. Teheran
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 458 KB
- Volume
- 252
- Category
- Article
- ISSN
- 0040-6090
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## Abstract Thin films of SnO~2~ have been successfully deposited by atomic layer deposition (ALD) using the SnI~4~/O~2~ precursor combination. Depositions were carried out in the temperature range 400β750βΒ°C on SiO~2~/Si(100) and singleβcrystalline Ξ±βAl~2~O~3~(012) substrates. The films were found