✦ LIBER ✦

Structural and gas response characterization of nano-size SnO2 films deposited by SILD method

✍ Scribed by G. Korotcenkov; V. Macsanov; V. Tolstoy; V. Brinzari; J. Schwank; G. Faglia

Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 324 KB
Volume: 96
Category: Article
ISSN: 0925-4005
DOI: 10.1016/j.snb.2003.07.002

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✦ Synopsis

The possibilities of successive ionic layer deposition (SILD) technology for deposition of nano-scalled SnO 2 films are discussed in this article. SnO 2 films deposited using this technology contain porous agglomerated structures consisting of nano-size crystallites. Even after annealing at T an = 800 • C, the average size of crystallites does not exceed 6-7 nm. The average size of agglomerates depends on film thickness, and ranges from 20 to 80 nm. These SnO 2 films have good gas response especially to ozone and H 2 . However, the rate of response to these gases is different. The response to ozone is fast, while the response to exposure to reducing gas, such as H 2 , is slow. It is assumed that inter-crystallite gas diffusion in agglomerates limits the rate of response to reducing gases.

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