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Kinetics and mechanism of low-pressure, high-temperature oxidation of silicon-II

✍ Scribed by C. Gelain; A. Cassuto; P. Goff

Publisher: Springer-Verlag
Year: 1971
Tongue: English
Weight: 537 KB
Volume: 3
Category: Article
ISSN: 0030-770X
DOI: 10.1007/bf00603483

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