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Kinetic study of WSix-CVD processes—a comparison of WF6/SiH4 and WF6/Si2H6 reaction systems

✍ Scribed by Takeyasu Saito; Yukihiro Shimogaki; Yasuyuki Egashira; Hiroshi Komiyama; Katsuro Sugawara; Katsumi Takahiro; Shinji Nagata; Sadae Yamaguchi


Book ID
112079069
Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
930 KB
Volume
78
Category
Article
ISSN
8756-663X

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