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Kinetics of chemical vapor deposition of WSix films from WF6 and SiH2Cl2: Effect of added H2, SiH4, and Si2H6

✍ Scribed by Takeyasu Saito; Yukihiro Shimogaki; Yasuyuki Egashira; Katsuro Sugawara; Katsumi Takahiro; Shinji Nagata; Sadae Yamaguchi; Hiroshi Komiyama

Book ID: 108207649
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 161 KB
Volume: 83
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2006.03.004

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