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Kinetic studies on CF4plasmas during etching of Si

✍ Scribed by Werner W. Brandt; Paul Roselle

Book ID: 104812331
Publisher: Springer
Year: 1983
Tongue: English
Weight: 316 KB
Volume: 3
Category: Article
ISSN: 0272-4324
DOI: 10.1007/bf00564631

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