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Kinetic aspects of plasma etching of polyimide in CF4O2 discharges

โœ Scribed by P.M. Scott; S.V. Babu; R.E. Partch; L.J. Matienzo


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
597 KB
Volume
27
Category
Article
ISSN
0141-3910

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