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Kinetic factors in the chemical vapor deposition of carbon from methane

✍ Scribed by M.L. Lieberman


Publisher
Elsevier Science
Year
1975
Tongue
English
Weight
212 KB
Volume
13
Category
Article
ISSN
0008-6223

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πŸ“œ SIMILAR VOLUMES


25. Kinetic factors in the chemical vapo
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## ABSTRACTS that the shape and sharpness of the three-dimensional ( 101) and ( 112) reflection, respectively, are considerably developed with time, whereas the mean interlayer spacing as determined by the (004) line is not changed significantly for holding times longer than 15 min.

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The relations between chemical vapor deposition (CVD) parameters and the resultant pyrolytic carbon microstructures have been examined for matrix deposition in fibrous carbon substrates. The parameters considered are temperature (1200-145O"C), pressure (20-630 Torr), C/H ratio (l/4-1/14), total flow

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Using an isothermal flow reactor of annular configuration, the rates of carbon deposition from CH4 and C,O, have been measured over the respective temperature ranges, 1168Β°-13720K and 900"-1025Β°K. Under the experimental conditions employed, deposition from both of these compounds is found to be cont