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Computational simulation of chemical kinetics and fluid transport in chemical vapor deposition

✍ Scribed by Robert J. Kee; Greg H. Evans; Michael E. Coltrin


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
201 KB
Volume
28
Category
Article
ISSN
0008-6223

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πŸ“œ SIMILAR VOLUMES


Halide-Transport Chemical Vapor Depositi
✍ J.-P. Ge; J. Wang; H.-X. Zhang; X. Wang; Q. Peng; Y.-D. Li πŸ“‚ Article πŸ“… 2005 πŸ› John Wiley and Sons 🌐 English βš– 424 KB πŸ‘ 2 views

## Abstract ZnS:M^2+^ (M = Mn, Co, or Cu) single‐crystal one‐dimensional nanostructures have been prepared via a simple halide‐transport chemical vapor deposition (HTCVD) process at a relatively low temperature. The obvious phase transition suggests that doping with Mn favors the formation of the h

25. Kinetic factors in the chemical vapo
✍ M.L Lieberman; G.T Noies πŸ“‚ Article πŸ“… 1973 πŸ› Elsevier Science 🌐 English βš– 128 KB

## ABSTRACTS that the shape and sharpness of the three-dimensional ( 101) and ( 112) reflection, respectively, are considerably developed with time, whereas the mean interlayer spacing as determined by the (004) line is not changed significantly for holding times longer than 15 min.