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Combinatorial Chemical Vapor Deposition. Achieving Compositional Spreads of Titanium, Tin, and Hafnium Oxides by Balancing Reactor Fluid Dynamics and Depositions Kinetics.

✍ Scribed by Ryan C. Smith; Noel Hoilien; Jimmy Chien; Stephen A. Campbell; Jeffrey T. Roberts; Wayne L. Gladfelter


Publisher
John Wiley and Sons
Year
2003
Weight
68 KB
Volume
34
Category
Article
ISSN
0931-7597

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