Ion irradiation of porous silicon: The role of surface states
β Scribed by L.G. Jacobsohn; B.L. Bennett; D.W. Cooke; R.E. Muenchausen; M. Nastasi
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 127 KB
- Volume
- 242
- Category
- Article
- ISSN
- 0168-583X
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β¦ Synopsis
Porous Si was obtained by electrochemical etching of p-doped Si(1 0 0) and progressively irradiated with H + , He + or Ne 2+ ions. Photoluminescence (PL) spectra were obtained as a function of the displacement-per-atom parameter up to $0.01 level, which nearly extinguished emission. The PL quenching efficiency, which showed a dependence on the chemical nature of the implanted species, was correlated with the self-recovery of the defects as investigated by channeling spectrometry. Emission recovery and enhancement after irradiation indicated the importance of surface states in the PL mechanism.
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## Abstract MicroβRaman studies were performed on ionβirradiated oxidized silicon surfaces with different ion energies, ion fluences and subsequent hydrogenation to determine the efficacy and sensitivity for obtaining information on the degree of ion beamβinduced damage in very thin (__ca.__ 100 Γ )