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Ion-implanted TiN films as diffusion barriers in silicon device technology

✍ Scribed by A. Armigliato; M. Finetti; A. Garulli; S. Guerri; R. Lotti; P. Ostoja

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Applications of TiN thin films in silico

✍ M. Wittmer; H. Melchior 📂 Article 📅 1982 🏛 Elsevier Science 🌐 English ⚖ 487 KB

Electron microscopy observations of N2+

✍ A. Armigliato; M. Finetti; S. Guerri; P. Ostoja; A. Scorzoni; J. Garrido 📂 Article 📅 1986 🏛 Elsevier Science 🌐 English ⚖ 397 KB

CO2-laser induced annealing and diffusio

✍ R. Langfeld; H. Baumann; K. Bethge; H. Jex 📂 Article 📅 1981 🏛 Elsevier Science 🌐 English ⚖ 239 KB

Growth and properties of TiN and TiOxNy

📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 158 KB

Preparation of CuTi-Cu3Ti compound alloy

✍ Ken-Ichi Yoshimoto; Katsutaka Sasaki; Hideto Yanagisawa; Atsushi Noya 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 629 KB