Growth and properties of TiN and TiOxNy diffusion barriers in silicon on sapphire integrated circuits: N Kumar et al, Thin Solid Films, 153, 1987, 287–301

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 158 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)90326-6