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Ion bombardment and temperature effects on the microstructure of RF plasma chemical vapor-deposited SiC:H

✍ Scribed by L. Thomas; M. Ducarroir; R. Hillel; R. Berjoan

Book ID
108422881
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
268 KB
Volume
142-144
Category
Article
ISSN
0257-8972

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