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Influence of ion bombardment on a-Si: H films fabricated by plasma chemical vapor deposition

โœ Scribed by Isamu Kato; Toshiyuki Yoneda; Toru Matsushita


Book ID
112078986
Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
566 KB
Volume
78
Category
Article
ISSN
8756-663X

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