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Effect of reactant depletion on the microstructure and preferred orientation of polycrystalline SiC films by chemical vapor deposition

โœ Scribed by Dong-Joo Kim; Doo-Jin Choi; Young-Wook Kim


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
661 KB
Volume
266
Category
Article
ISSN
0040-6090

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