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Ion beam sputter deposition of Ag films: Influence of process parameters on electrical and optical properties, and average grain sizes

โœ Scribed by Bundesmann, C.; Feder, R.; Gerlach, J.W.; Neumann, H.

Book ID
121449131
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
723 KB
Volume
551
Category
Article
ISSN
0040-6090

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TiAlN films prepared using ion beam sputter deposition (IBSD) method are planed to be used as both the bottom electrode and diffusion barrier for a metal-insulator-metal (MIM) (Ba,Sr)TiO 3 (BST) capacitor in our study. We had shown the effects of ion beam voltage, substrate temperature on electrical