Ion-assisted nanorod growth by dc magnetron sputtering
β Scribed by Rogov, A. V. ;Fanchenko, S. S. ;Varfolomeev, A. E.
- Book ID
- 105363396
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 299 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0031-8965
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β¦ Synopsis
Abstract
Highβrate cathode growth of nanorods is observed for dc magnetron sputtering of graphite, germanium and molybdenum cathodes despite the sputtering. The growth of vertically aligned carbon nanorods using dc magnetron sputtering with deuterium as the working gas and a polycrystalline nuclear graphite cathode is reported for the first time. Two different types of carbon nanorodes are observed differing in their diameter/length ratio. Highβrate nanorod growth is also observed for the usual magnetron sputtering with argon as a working gas for molybdenum and germanium singleβcrystal cathodes. The high growth rate (tens of micrometres per hour) is discussed in the context of ionβstimulated surface mobility of the neutral atoms and their redeposition in nonhomogeneous cathode sputtering. (Β© 2005 WILEYβVCH Verlag GmbH & Co. KGaA, Weinheim)
π SIMILAR VOLUMES
CrB 2 coatings were synthesized on high speed steel (HSS) substrates using inductively coupled plasma (ICP) assisted DC magnetron sputtering, and the structure and properties of the CrB 2 coating produced at different ICP powers and substrate biases were investigated. The hardness of the CrB 2 coati
In conventional balanced-magnetron (CBM) sputtering, the amount of ion bombardment of the growing film, as measured by the substrate bias current density, is limited to less than 1 mA cm -z. Fast secondary electrons escaping from the target surface quickly find a path to ground and undergo few ioniz