CrB2 coatings deposited by inductively coupled plasma assisted DC magnetron sputtering
โ Scribed by H.S. Choi; B. Park; J.J. Lee
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 896 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0257-8972
No coin nor oath required. For personal study only.
โฆ Synopsis
CrB 2 coatings were synthesized on high speed steel (HSS) substrates using inductively coupled plasma (ICP) assisted DC magnetron sputtering, and the structure and properties of the CrB 2 coating produced at different ICP powers and substrate biases were investigated. The hardness of the CrB 2 coatings increased from 30 GPa to 54 GPa by increasing the ICP power as well as the negative substrate bias. By increasing ICP power, the preferred orientation of the CrB 2 coating changed from ( 101) to (001). The CrB 2 coating showed excellent corrosion resistance. The corrosion resistance of the CrB 2 coatings was also found to be much better than that of the TiB 2 coatings. The adhesion strength of the film could be improved considerably after ICP nitriding of the substrate.
๐ SIMILAR VOLUMES
## Abstract Titanium dioxide (TiO~2~) films are produced by inductively coupled plasmaโassisted (ICP) CVD at various H~2~ flow rates. Anatase and rutile TiO~2~ films are obtained without any external heating. The surface morphologies, structures, and deposition rates of the TiO~2~ films are strongl