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Investigations of electron beam induced conductivity in silicon oxide thin films

โœ Scribed by S. S. Borisov; P. S. Vergeles; E. B. Yakimov


Book ID
110203300
Publisher
Pleiades Publishing
Year
2010
Tongue
English
Weight
152 KB
Volume
4
Category
Article
ISSN
1027-4510

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A study of ion beam analysis techniques of plasma enhanced chemical vapor deposited (PECVD) silicon oxide thin films (1 lm thick) obtained from silane (SiH 4 ) and nitrous oxide (N 2 O) is reported. The film, elemental composition and surface morphology were determined as function of the reactant ga