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Investigation of the extinction coefficient of PECVD hydrogenated amorphous silicon nitride films

✍ Scribed by Yan, Xu; Feng, Fei; Yang, Guangli; Wang, Yuelin

Book ID
125886263
Publisher
Institute of Physics
Year
2008
Tongue
English
Weight
161 KB
Volume
18
Category
Article
ISSN
0960-1317

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The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well