Investigation of crystalline orientation
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Saito, Kimihiko ;Kondo, Michio
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Article
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2010
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John Wiley and Sons
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English
β 502 KB
## Abstract Crystalline orientation factors in microcrystalline silicon (Β΅cβSi) deposition are investigated by the triodeβplasma enhanced chemical vapor deposition (PECVD) method and conventional diodeβPECVD with optical emission spectroscopy (OES). The existence of more important factors for the o