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Characteristics of thin plasmachemical silicon carbon nitride films deposited using hexamethyldisilane

✍ Scribed by V. I. Ivashchenko; O. K. Porada; L. A. Ivashchenko; I. I. Timofeeva; O. K. Sinel’nichenko; O. O. Butenko; M. V. Ushakov; L. A. Ushakova

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