Investigation of self-aligned p++-GaAs/n-InGaP heterojunction field-effect transistors
β Scribed by W.-S. Lour; M.-K. Tsai; K.-C. Chen; S.-W. Tan; Y.-W. Wu; Y.-J. Yang
- Book ID
- 104427982
- Publisher
- Elsevier Science
- Year
- 2002
- Tongue
- English
- Weight
- 206 KB
- Volume
- 13
- Category
- Article
- ISSN
- 1386-9477
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β¦ Synopsis
p ++ -GaAs=n-InGaP heterojunction ΓΏeld-e ect transistors (HJFETs) with a highly carbon-doped gate and a wide-gap channel were reported. A self-aligned T-shaped gate HJFET exhibits a gate of 0:6 m in length by depositing gate metal of 1:0 m. DC characteristics including a turn-on voltage of 2:0 V at 1 mA=mm, a gate-drain breakdown voltage up to 30 V, a drain-source breakdown voltage exceeding 25 V, a maximum available transconductance of 160 mS=mm and AC performances such as a unit-current gain frequency of 16:8 GHz, and a unit-power gain frequency of 25 GHz were obtained for a non-self-aligned HJFET. With a self-aligned processing structure, the transconductance and fmax were improved to 230 mS=mm and 35 GHz, respectively.
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