Investigation of properties of the Si-SiO2 interface in MOS structures irradiated by fast electrons
β Scribed by Bogatyrev, Yu. V. ;Korshunov, F. P.
- Publisher
- John Wiley and Sons
- Year
- 1978
- Tongue
- English
- Weight
- 185 KB
- Volume
- 48
- Category
- Article
- ISSN
- 0031-8965
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π SIMILAR VOLUMES
Defects induced by high-energy electrons in Si-SiO 2 structure have been studied by the optically stimulated electron emission (OSEE) method. Si-SiO 2 structures with oxide thickness of 100 nm are irradiated with 23 MeV electrons for different durations. It is shown that most of the defects created
We have studied the solid/solid interface between Mo and SiO 2 films deposited, respectively, by magnetron d.c. sputtering and plasma-enhanced chemical vapour deposition (PECVD). The sample depth profile was characterized by SIMS. We used electron-induced x-ray emission spectroscopy to characterize