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Investigation of InP/InGaAs superlattice-emitter resonant tunneling bipolar transistors (RTBTs)

โœ Scribed by Wei-Chou Wang; Hsi-Jen Pan; Kun-Wei Lin; Kuo-Hui Yu; Cheng-Zu Wu; Lih-Wen Laih; Shiou-Ying Cheng; Wen-Chau Liu


Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
800 KB
Volume
29
Category
Article
ISSN
0749-6036

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โœฆ Synopsis


An InP/InGaAs superlattice-emitter resonant tunneling bipolar transistor (SE-RTBT) has been fabricated and demonstrated. The influence of the superlattice and emitter thickness on the device characteristics is studied. The insertion of the superlattice and a welldesigned emitter improve the characteristics of the SE-RTBT. Common-emitter current gains up to 170 and 54 are obtained for the studied devices with emitter thicknesses of 800 ร… and 150 ร…, respectively. Based on the specified structure, the lower offset voltage and saturation voltage (โ‰ค1.5 V) are obtained. Experimentally, the device with a 5-period superlattice and an emitter thickness of 800 ร… provides higher dc performance and stable temperature-dependent characteristics.


๐Ÿ“œ SIMILAR VOLUMES


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A new bipolar transistor with a 20-period i-AlInAs/n + -InGaAs superlattice, prepared by metal organic chemical vapour deposition, has been fabricated and demonstrated. This superlattice is used as a confinement barrier for holes and a resonant tunneling (RT) route for electrons. Due to the RT effec

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A superlattice-emitter resonant-tunneling bipolar transistor (SE-RTBT) has been successfully fabricated using GaAs based materials and demonstrated in this paper. In an SE-RTBT, the \(\mathrm{i}-\mathrm{Al}_{0.5} \mathrm{Ga}_{0.5} \mathrm{As} / \mathrm{n}^{+}-\mathrm{GaAs}\) superlattice is used as