A new bipolar transistor with a 20-period i-AlInAs/n + -InGaAs superlattice, prepared by metal organic chemical vapour deposition, has been fabricated and demonstrated. This superlattice is used as a confinement barrier for holes and a resonant tunneling (RT) route for electrons. Due to the RT effec
Investigation of InP/InGaAs superlattice-emitter resonant tunneling bipolar transistors (RTBTs)
โ Scribed by Wei-Chou Wang; Hsi-Jen Pan; Kun-Wei Lin; Kuo-Hui Yu; Cheng-Zu Wu; Lih-Wen Laih; Shiou-Ying Cheng; Wen-Chau Liu
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 800 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0749-6036
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โฆ Synopsis
An InP/InGaAs superlattice-emitter resonant tunneling bipolar transistor (SE-RTBT) has been fabricated and demonstrated. The influence of the superlattice and emitter thickness on the device characteristics is studied. The insertion of the superlattice and a welldesigned emitter improve the characteristics of the SE-RTBT. Common-emitter current gains up to 170 and 54 are obtained for the studied devices with emitter thicknesses of 800 ร and 150 ร , respectively. Based on the specified structure, the lower offset voltage and saturation voltage (โค1.5 V) are obtained. Experimentally, the device with a 5-period superlattice and an emitter thickness of 800 ร provides higher dc performance and stable temperature-dependent characteristics.
๐ SIMILAR VOLUMES
A superlattice-emitter resonant-tunneling bipolar transistor (SE-RTBT) has been successfully fabricated using GaAs based materials and demonstrated in this paper. In an SE-RTBT, the \(\mathrm{i}-\mathrm{Al}_{0.5} \mathrm{Ga}_{0.5} \mathrm{As} / \mathrm{n}^{+}-\mathrm{GaAs}\) superlattice is used as