An InP/InGaAs superlattice-emitter resonant tunneling bipolar transistor (SE-RTBT) has been fabricated and demonstrated. The influence of the superlattice and emitter thickness on the device characteristics is studied. The insertion of the superlattice and a welldesigned emitter improve the characte
Investigation of an AlInAs/GaInAs superlattice-emitter resonant tunneling bipolar transistor (SE-RTBT)
โ Scribed by S.-Y. Cheng; W.-L. Chang; W.-C. Liu; W. Lin
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 118 KB
- Volume
- 22
- Category
- Article
- ISSN
- 0749-6036
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โฆ Synopsis
A new bipolar transistor with a 20-period i-AlInAs/n + -InGaAs superlattice, prepared by metal organic chemical vapour deposition, has been fabricated and demonstrated. This superlattice is used as a confinement barrier for holes and a resonant tunneling (RT) route for electrons. Due to the RT effect within the 20-period superlattice near emitter-base p-n junction region, the N-shaped negative-differential-resistance (NDR) phenomena are observed under normal operation. A transistor action with a common-emitter current gain of 13 and a small offset voltage (โผ90 mV) is achieved at room temperature.
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