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Interlaboratory study comparing analyses of simulated angle-resolved X-ray photoelectron spectroscopy data

✍ Scribed by Tasneem, G.; Werner, W. S. M.; Smekal, W.; Powell, C. J.

Book ID
121785881
Publisher
John Wiley and Sons
Year
2014
Tongue
English
Weight
692 KB
Volume
46
Category
Article
ISSN
0142-2421

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## Abstract Angle‐resolved x‐ray photoelectron spectroscopy (ARXPS) has been used to study the composition of oxides grown on γ€ˆ110〉 and γ€ˆ100〉 GaAs during exposure to UV/ozone. The effects of substrate treatments on oxide growth were compared on γ€ˆ100〉 surfaces exposed to an HF treatment and thermal